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Pre-treatmentExtractionEquipmentforComponentCleanlinessTesting

WV-QX800 Automatic Cleanliness Particle Extractor

The WV-QX800 Automatic Cleanliness Particle Extractor is a core pre-treatment device for cleanliness testing developed by Chongqing Wanwei. It is specially designed for cleanliness sample preparation of precision components in automotive, hydraulic and new energy industries. The equipment integrates four major extraction processes to strip particulate contaminants from component surfaces and inner cavities. Its 316 stainless steel fluid circuit is anti-static and non-particle-shedding. Combined with PALL filter elements, it controls the equipment background level. It features simple operation and supports OEM customization. It can be matched with the WV-GX600 Automatic Particle Optical Analysis Microscope to build a complete laboratory for component cleanliness testing.
WV-QX800 Automatic Cleanliness Particle Extractor

Product Features

Specifications

Product Parameters
Basic Equipment Information
Equipment Model WV-QX800
Full Equipment Name Automatic Particle Liquid Extraction Equipment
Spray Washing Process
Calculation Formula for Spray Volume Vst/A=5ml/cm² × √200cm²/A_CP
Minimum Total Detection Area 200 cm²
Cleaning Principle Jet momentum scouring, with full flushing by cleaning liquid
Ultrasonic Extraction
Operating Frequency 35-40 kHz
Cavitation Noise Level ≥206dB(IEC TS 63001:2024 Annex A and B)
Extraction Time 30-60 s
Recommended Extraction Area >200 cm²
Inner Cavity Cleaning
Flow Velocity for 4 mm Pipe Diameter 1.4 L/min
Flow Velocity for 5 mm Pipe Diameter 1.8 L/min
Flow Velocity for 6 mm Pipe Diameter 2.2 L/min
Turbulence Coefficient Re>4000
Shaking Cleaning
Tank Filling Volume 30-40%
Shaking Amplitude 约 30 cm
Shaking Frequency 1 Hz
Extraction Duration 15 s
Material Surface
8K Mirror Stainless Steel Roughness Ra 0.05~0.1 μm
Teflon Coating Roughness Ra 0.5~1.0 μm
Cold Cleaning Agent  
Flash Point 62 ℃
Kinematic Viscosity 1.9 mm²/s
Equipment Background
Blank Metallic Particles of Standard Model ≤50 μm

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